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Glow-Discharge Hydrogenated Amorphous Silicon (1990)
Glow-Discharge Hydrogenated Amorphous Silicon (1990)
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ISBN 9780792303091
A graduate-level description of recent Japanese research on the chemistry of amorphous silicon film deposition associated with plasma CVD, a step in producing amorphous semiconductors. Reports on studies (of microscopic processes of gas-phase reaction as well as chemical reactions on the film growin
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Pub dateNov 30, 1989
ISBN-100792303091
ISBN-139780792303091
LanguageEnglish
Last updated 2026-09-08 12:22
$342.30
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