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Machine Learning-Based Modelling in Atomic Layer Deposition Processes
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Publisher
CRC Press
Published
Dec 15, 2023
ISBN-13
9781032386706

Machine Learning-Based Modelling in Atomic Layer Deposition Processes

by Adeleke, Oluwatobi
No customer reviews yet ISBN 9781032386706 CRC Press

This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.

Product details

BrandCRC Press
Pub dateDec 15, 2023
ISBN-101032386703
ISBN-139781032386706
Hardcover376.0 pages
LanguageEnglish
Dimensions9.21 × 6.14 × 0.84 in
Weight1 lb
Last updated 2026-10-15 09:07
$260.17
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