Original Image
click to view more

Machine Learning Based Modelling in Atomic Layer Deposition Processes Emerging Materials and Techn

by [Adeleke, Oluwatobi, Karimzadeh, Sina, Jen, Tien-Chien]

$224.00

add to favourite
  • In Stock soon, order now to reserve your copy.
  • FREE DELIVERY
  • 24/24 Online
  • Yes High Speed
  • Yes Protection
Tell-A-Friend
Last update:

Description

This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.

Last updated on

Product Details

  • CRC Press Brand
  • Dec 15, 2023 Pub Date:
  • 9781032386706 ISBN-13:
  • 1032386703 ISBN-10:
  • 376.0 pages Hardcover
  • English Language
  • 9.21 in * 6.14 in * 0.84 in Dimensions:
  • 1 lb Weight: