Skip to content
Home/ Machine Learning-Based Modelling in Atomic Layer Deposition Processes
Machine Learning-Based Modelling in Atomic Layer Deposition Processes

Machine Learning-Based Modelling in Atomic Layer Deposition Processes

by Adeleke, Oluwatobi
No customer reviews yet ISBN 9781032386737

This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.

About the author

Product details

Pub dateMay 6, 2025
ISBN-101032386738
ISBN-139781032386737
LanguageEnglish
Last updated 2026-09-07 16:20
$77.22
In stock — ships in 24 hours with free tracking
Delivery by Monday, September 28, 2026
Qty
Sign in to Add to Saved list
Free delivery on orders over $35.
15-day returns. Any reason.
Secure checkout. We never store card details.

Readers who bought this also bought

More from Chemical & Biochemical
See all
Thermodynamics and Chemistry
Devoe, Howard
Tubular Heat Exchanger: Inspection, Maintenance and Repair
Andreone, Carl F
$126.03
Properties of Gases and Liquids 5e (Revised)
Poling, Bruce
$136.31
Process Systems Analysis and Control (Revised)
Coughanower, Donald R
$206.00
Thermodynamics of Hydrocarbon Reservoirs
Firoozabadi, Abbas
$142.72
Distillation Design
Kister, Henry Z
$151.03